loading

3759 results for found: utilisé Photoresist

1 2 3 4 5 6 Prochain
  • ADIXEN: AMS 100

    ADIXEN AMS 100 ICP plasma etcher, 8" High vacuum pump: ATH 1300M-ATH 1600M Source RF generator: Dressler 1330 400V Source matching box control unit: CBA PL LF generator: Advanced energy LF5 substrate holder RF generator: Dressler 133 substrate holder Matching box control unit: VM 600A SH Chiller: Landa RK8 CP High vacuum pressure gauge; ACC 1009 chamber Load lock pressure gauge; AP 1004 Process pressure gauge: ASD 100x - ARD 100x Atmospheric pressure detection: MKS 902 Helium pressure gauge: Mini convectron PC chassis: IPC 610 Industrial UPS rack: 1500 LCD screen LCD 1560NX MFC, unit and Horiba-STEC MFC: 500sccm CF4 500sccm CHF3 530sccm C4F8 10slm N2 4slm SF6 Used for: Deep Silicon Etch, SDiE / Bosch process Manuals Decommissioned: Q1 2014 2004 vintage.
  • ADIXEN: AMS 100

    ADIXEN AMS 100 ICP plasma etcher, 8" High vacuum pump: ATH 1300M-ATH 1600M Source RF generator: Dressler 1330 400V Source matching box control unit: CBA PL LF generator: Advanced energy LF5 substrate holder RF generator: Dressler 133 substrate holder Matching box control unit: VM 600A SH Chiller: Landa RK8 CP High vacuum pressure gauge; ACC 1009 chamber Load lock pressure gauge; AP 1004 Process pressure gauge: ASD 100x - ARD 100x Atmospheric pressure detection: MKS 902 Helium pressure gauge: Mini convectron PC chassis: IPC 610 Industrial UPS rack: 1500 LCD screen LCD 1560NX MFC, unit and Horiba-STEC MFC: 500sccm CF4 500sccm CHF3 530sccm C4F8 10slm N2 4slm SF6 Used for: Deep Silicon Etch, SDiE / Bosch process Manuals Decommissioned: Q1 2014 2004 vintage.
  • ADIXEN: AMS 100

    ADIXEN AMS 100 ICP plasma etcher, 8" High vacuum pump: ATH 1300M-ATH 1600M Source RF generator: Dressler 1330 400V Source matching box control unit: CBA PL LF generator: Advanced energy LF5 substrate holder RF generator: Dressler 133 substrate holder Matching box control unit: VM 600A SH Chiller: Landa RK8 CP High vacuum pressure gauge; ACC 1009 chamber Load lock pressure gauge; AP 1004 Process pressure gauge: ASD 100x - ARD 100x Atmospheric pressure detection: MKS 902 Helium pressure gauge: Mini convectron PC chassis: IPC 610 Industrial UPS rack: 1500 LCD screen LCD 1560NX MFC, unit and Horiba-STEC MFC: 500sccm CF4 500sccm CHF3 530sccm C4F8 10slm N2 4slm SF6 Used for: Deep Silicon Etch, SDiE / Bosch process Manuals Decommissioned: Q1 2014 2004 vintage.
  • ADIXEN: AMS 100

    ADIXEN AMS 100 ICP plasma etcher, 8" High vacuum pump: ATH 1300M-ATH 1600M Source RF generator: Dressler 1330 400V Source matching box control unit: CBA PL LF generator: Advanced energy LF5 substrate holder RF generator: Dressler 133 substrate holder Matching box control unit: VM 600A SH Chiller: Landa RK8 CP High vacuum pressure gauge; ACC 1009 chamber Load lock pressure gauge; AP 1004 Process pressure gauge: ASD 100x - ARD 100x Atmospheric pressure detection: MKS 902 Helium pressure gauge: Mini convectron PC chassis: IPC 610 Industrial UPS rack: 1500 LCD screen LCD 1560NX MFC, unit and Horiba-STEC MFC: 500sccm CF4 500sccm CHF3 530sccm C4F8 10slm N2 4slm SF6 Used for: Deep Silicon Etch, SDiE / Bosch process Manuals Decommissioned: Q1 2014 2004 vintage.
  • AIO: SF-600

    AIO SF-600 IPA dryer, up to 8" 120 VAC, 15 A, 50/60 Hz.
  • AIO: SF-600

    AIO SF-600 IPA dryer, up to 8" 120 VAC, 15 A, 50/60 Hz Can be inspected / demonstrated.
  • AIO: SF-600

    AIO SF-600 IPA dryer, up to 8" 120 VAC, 15 A, 50/60 Hz.
  • AIO: SF-600-3

    AIO SF-600-3 IPA dryer, up to 8" capable Specifications: Chamber dimensions (W x D): 12 x 12" Currently configured with (1) 8" wafer carrier Can be configured for (2) 6" carriers Spare OMRON interactive display unit included Manuals not included Power requirements: 120VAC, 15A, 50/60Hz Warehoused Can be inspected and demonstrated.
  • AIO: 800

    AIO 800 Dual coater / Developer system With robots HMDS Coater cup (2) Heater plates Cool plate Developer: Cool / Hot plate Developer cup Chem cabinet Controller: Temp and humidity.
  • AIO: SF-600

    AIO SF-600 IPA dryer, up to 8" 120 VAC, 15 A, 50/60 Hz.
  • AIO: SF-600

    AIO SF-600 IPA dryer, up to 8" 120 VAC, 15 A, 50/60 Hz Can be inspected / demonstrated.
  • AIO: SF-600

    AIO SF-600 IPA dryer, up to 8" 120 VAC, 15 A, 50/60 Hz Can be inspected / demonstrated.
  • AIO / RITE TRACK: SVG 90

    AIO / RITE TRACK SVG 90 (2) Coaters / (2) Developers system, 8" (5) Wafertec pumps Bake plates Vacuum bake Hotplate Cool plate Currently installed.
  • AIO / RITE TRACK: SVG88

    AIO / RITE TRACK SVG88 Dual track coater / developer, 6" Track 1: Intelligent pump Stand alone No interface INDX > HPO > HPO > Coater > Primer > CP > HPO > INDX Track 2: Stand alone No interface: INDX > HPO > CP > Developer > HPO > HPO > INDX.
  • ALLIED SIGNAL: ELECTRONCURE 30X-150-A-II

    ALLIED SIGNAL: ElectronCure 30X-150-A-II E-beam photoresist curing system, non-operational Electron beam exposure system capable of exposing large area substrates uniformly at precision dose for curing coatings and hardening photoresist Variable beam voltage 0-30 KV in 100V steps Computer controlled, fully automatic 3" to 6" round wafers 4" x 4" square plates Operates at 55 millitorr vacuum De-installed.
  • ALLIED SIGNAL: ELECTRONCURE 30X-150-A-II

    ALLIED SIGNAL ElectronCure 30X-150-A-II E-beam photoresist curing system, non-operational Electron beam exposure system capable of exposing large area substrates uniformly at precision dose for curing coatings and hardening photoresist Variable beam voltage 0-30 KV in 100V steps Computer controlled, fully automatic 3" to 6" round wafers 4" x 4" square plates Operates at 55 millitorr vacuum De-installed.
  • ALLTEQ: 1500 SERIES

    ALLTEQ 1500 Series Dispensing system Model No.: M1520E 2002 vintage.
  • ALPHA METALS / COOKSON / SCS: PDS 2010

    ALPHA METALS / COOKSON / SCS PDS 2010 Parylene deposition system 115 V, 20 A, 1 Ph, 60 Hz.
  • APET: SYSTEM

    APET System Dryer, 8" - 12" Includes power supply and canister.
  • APET: NEO-2000 GEN 1.5

    APET NEO-2000 Gen 1.5 Screen dryer.
Montrer par page
1 2 3 4 5 6 Prochain