Occasion PERKIN ELMER 4450 #9199550 à vendre en France

Sputtering system, 8" Wafer loading: Manual with load lock Cathode: (3) Delta shapes (4) Circle shapes Sputter method: RF/DC Diode / MAGNETRON Process chamber: 8" Diameter x 12" High stainless steel cylinder with 6" CF Flange view port and load lock port 28" Diameter stainless steel base plate 11/2" Air operated roughing isolation valve Air operated gas inlet valve Air operated vent valve 11/2" Blanked-off leak check port Removable deposition shields 23" Diameter, 3-position water cooled annular substrate Table with variable speed motorized table drive Full circle shutter and vane shutter Chain drive pallet carrier transport Heavy duty electric hoist Load lock: 30" x 28" x 8" Stainless steel load lock chamber Aluminum cover Chain drive pallet carrier transport 2" Air operated roughing isolation valve Air operated vent valve 23" Diameter molybdenum annular substrate pallet Elevator for pallet up and down function Vacuum systems for process chamber: (2) Stage cryo pumps With 1000 l/s pumping speed for air Includes: Chevron Water cooled compressor and lines Automatic regeneration controller Plumbing kit, 71/2" Aluminum air operated gate valve: 6" ASA Air operated venetian blind throttling valve Mechanical pump or dry pump for process: 36.7 Cfm Chamber and load lock Gas line with MFC N2 O2 SCCM Customized System PC control Options: Gas lines with MFC N2 O2 Customized Lamp tower alarm with buzzer: Mechanical pump / Dry pump for process chamber and load lock Independent mechanical pump / Dry pump for process chamber Chiller for cooling plates and table Turbo pump for load lock Load lock lamp heating function: Up to 200°C Chamber lamp heating function: Up to 300°C Plasma etch function Bias function Co sputter function Reactive sputter function Materials: AI+W InSnO AI2O3 Ag_ Au C Cr Cr/Co Cr/Au Cr+Cu Cr/Si Cr/SiO Cr/Si02 Si02 Mo MoSi2 Mo2Si5 Mc>5Si3 Ni Ni/Cr Ni+Ni/Cr Ni/Fe Pt Ti02 SiC Ti/W Si02+02 Si+N2(Si3N4) Si+N2+B4C Ta TaC Ta+Au TaSi2 Ta+Si02 Zr Ti02+Cr Ti+Au Ti+Au+Ni Ni/Fe+Cu+Si02 Ti/W+Au Ti/W+Au+Ta Ti/W+AI/Si Ti/W+Ni/Cr+Au Ti/W+Pt Al+Ti/W+Ag W+AI2O3 Zn Zri02 Basic configuration Main frame 28" Diameter SST chamber top plate with ports and cathodes: Configuration 4400 4410 / 4450 Cathode shape Circle Delta Cathode size 8" Delta Cathode quantity 1 to 4 1 to 3 Sputter power supply: 4400 4410 / 4450 DC Power 5 kW 5 kW / 10 kW RF Power 1kW / 2kW 2 KW / 3 kW Pulse DC Power 5 kW 5 KW / 10 kW Power distribution box: AC380 V / 208 V / 3 Phase.