loading

1593 RÉSULTATS TROUVÉS POUR: utilisé Mask & Wafer Inspection

1 2 3 4 5 6 Prochain
  • NANOMETRICS NANOSPEC M-210

    NANOMETRICS: NANOSPEC M-210

    Metrology inspection system Program software: DOS 6.20 (Japanes version) Software version: 2.30*1 Available wafer site: 8" Fouse control: Auto focus Light Source 400 to 800mw halogen lamp Used voltage/watt: 6V 15W Monitor/key board : CRT Spectrophotometer Head Photointensity meter reads: Zero intensity: 0.8, high intensity: 66 Gain 8 Zero control Wavelength counter control User interface RS232C Utility Power: AFT Controller 1COW Motor Driver controller 1COW Computer 1COW Printor 1COW 1993 vintage.
  • NIKON: 3

    Optistation microscopes.
  • LEICA / VISTEC MIS 200

    LEICA / VISTEC: MIS 200

    Wafer inspection system.
  • INTELLEMETRICS: IL-500

    Optical thickness monitor.
  • LEITZ: ERGOLUX

    Microscope with (5) lenses.
  • OSI: VLS-1

    CD Measurment System, setup for mask work with multiple size holders.
  • ZYGO: NEWVIEW MAXIM GP

    Interference scopes.
  • LEICA / VISTEC: INS 3000 DUV

    Defect inspection system, 4"-8" Power console with emergency off switch Signal tower Intermediate tube with camera port Microscope: 5x, 20x, 50x, 100x, 150x(1), 150x(2) Operator console with trackball and joystick (ASCII keyboard underneath) Observation tube with eyepieces X-Y stage Motorized beamsplitter LCD monitor Cassette port with tilting mechanism Control electronics Transport wheels Contamination protection Prealignment: Contact-free, ± 0.25° rotational < ± 50 micron in x and y Macro defect control: Optional wobbler with illumination device User interface: Windows NT based inspection Interface: RS 232-SECS 1/2, Ethernet interface DUV Function: Not setup Does not include: Macro defect control, wobbler with illumination device 2003 vintage.
  • IRVINE OPTICAL ULTRASTATION 3B

    IRVINE OPTICAL: ULTRASTATION 3B

    Wafer Inspection system with wafer loader, 3"-6" Nikon optics including 10x, 20x, 40x, 60x, BD objectives Bright field, dark field reflected light measurements 8"x15" stage 6"x6" stage movement.
  • PPT: 861HD

    High speed 3D Susp inspection system 3D sensor (1.9um Z resolutions, 20um x,y, resolution), 6-output pneumatic / vacuum module, Precision ground alignment tool, Fixture base plate, 3D calibration tool, 3D image processing PC.
  • LEITZ ERGOLUX

    LEITZ: ERGOLUX

    BF / DF Microscope with vertical illuminator 6V, 20W halogen lamphouse with socket and bulb Ergonomic tilting binocular head Pair of 10x WF eye pieces Motorized 5 place nose piece 10x, 20x, 50x, 100x, BF / DF objectives included 5"x 5" X-Y mechanical stage Built-in 6V, 20w power supply.
  • LEITZ ERGOLUX

    LEITZ: ERGOLUX

    BF / DF Microscope Modulopak vertical illuminator 6"x 6" X-Y mechanical stage with glass plate Ergonomic tilting trinocular head 12V, 100W lamphouse with socket and bulb Pair of 10x WF eye pieces Motorized 5 place nose piece NPL 5x, 10x, 20x, 50x, 100x BF / DF objectives included.
  • LEITZ ERGOLUX

    LEITZ: ERGOLUX

    Brightfield Microscope Stand Motorized nosepiece 12volt 100 watt regulating transformer 12 volt 100 watt Lamphouse Trinocular tilting head with photo tube 6”x 6” Stage with right hand drive Vertical illuminator and tube lens with apperture diaphragm's 10x Eyepieces 10x B DIC Objective 20x B DIC Objective 50x B DIC Objective 100x B DIC Objective UNIVERSAL USB Digital camera with c-mount and coupler Fluorescence vertical illuminator Brightfield Cube & UV Cube Complete with HBO 100 Power supply.
  • NIKON: OPTISTATION 3A

    Automated inspection stations, 5" 1991-1997 vintage.
  • KLA / TENCOR: 2135

    Wafer inspection system.
  • TAYLOR HOBSON TALYSURF 10

    TAYLOR HOBSON: TALYSURF 10

    Texture measuring machine Motorized column and stand.
  • NANOMETRICS NANOSPEC 6100

    NANOMETRICS: NANOSPEC 6100

    Film thickness analyzer, up to 8" 2001-2002 vintage.
  • KLA / TENCOR: 2132

    Inspection system, 8".
  • NANOMETRICS NANOSPEC AFT 4000

    NANOMETRICS: NANOSPEC AFT 4000

    Film thickness measurement system, 3"-8" Capable of accommodating wafers from 75mm to 200mm Olympus 5x, 10x, and 50xULWD objectives Olympus 10x eyepiece System Computer and Software Visible Single Layer Films: 500 – 50,000A UV Single Layer Films: 25 – 500A Visible Double (Top) Layer Films: 100 – 30,000A Visible Double (Bottom) Layer Films: 500 – 50,000A -Single Layer Thick Films Visible: 4 – 75 um Reflectance Visible: 400 – 850nm Oxide on Poly UV: 150 – 10,000A Oxide on Metal Visible: 3,000 – 20,000A Oxide on Metal UV: 500 – 5,000A Operator Manual and Documentation.
  • ESTEK / ADE: AWIS

    Inspection system, 12" 2004 vintage.
Montrer par page
1 2 3 4 5 6 Prochain